Enhancement of nonvolatile memory characteristics caused by GaN/AlN resonant tunnelling diodes

نویسندگان

چکیده

Abstract This paper reports an enhancement of the nonvolatile memory characteristics GaN/AlN resonant tunnelling diodes (RTDs) by reducing crystal defects in quantum well structure. Pit-shaped are strongly suppressed when pure N 2 , instead a /H mixture, is used as carrier gas and trimethylindium introduced surfactant for metalorganic vapor phase epitaxy In addition, density dislocations lowered controlling growth conditions structure buffer layer between RTD sapphire (0001) substrate. The leakage current through lowered, extremely high ON/OFF >1300, which 20 times higher than values obtained previous studies, induced. Theoretical calculations based on Poisson’s equation Tsu–Esaki formula indicate that ratio >10 3 can be enhanced increasing electrons accumulating to level order 10 18 cm –3 . Furthermore, operations were performed inputting sequential pulse voltages with speed nanosecond time scale faster speeds electron release from defects. These results RTDs due intersubband transitions accumulation not attributed trapping

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ژورنال

عنوان ژورنال: Semiconductor Science and Technology

سال: 2023

ISSN: ['0268-1242', '1361-6641']

DOI: https://doi.org/10.1088/1361-6641/acbaf8